PVD materials and technical Q & A
1. What is PVD?
PVD is physical vapor deposition, which refers to the process of using physical processes to realize material transfer and transfer atoms or molecules from the source to the substrate surface
2. What is CVD?
CVD (chemical vapor deposition) refers to the process of introducing the vapor containing gaseous or liquid reactants constituting film elements and other gases required for the reaction into the reaction chamber to produce a film by chemical reaction on the surface of the substrate
3. What are the advantages of PVD?
PVD physical vapor deposition is an environmentally friendly surface treatment method with low process temperature, usually the deposition temperature of the coating is 450 ℃, without any pollution, which is highly praised by developed countries in the world.
4. What is the scope of application of PVD?
At present, we are usually exposed to the following categories: optical coating (lens, glass, etc.), decorative coating, functional coating, etc. the coating requirements and evaluation standards of each industry are different.
5. What are the common methods of PVD?
The common methods of PVD include evaporation, sputtering, arc and other methods. Each method has its own characteristics, such as sputtering method has fine particles, few defects but poor combination, arc method has large particles and good adhesion, but the particles are coarse, and there are many surface defects such as droplets.
6. What is the PVD method of sembel?
Our company uses a combination of magnetron sputtering, magnetron cathode arc and ion beam.
7. What is the PVD process temperature of sembel?
According to the different products of our customers, the coating process temperature ranges from 60 ℃ to 250 ℃